For MOS observations slit masks need to be prepared in advance. In the current situation we rely on help from Copenhagen University not only to manufacture the masks but also to let observers run the software to process imaging data and define the distribution of slit-lets on the mask as it turns out that our own software can not handle the current data format. This is clearly not an optimal situation. Depending on any future demand for this observing mode we will review if we need to consider upgrading our own software to be able to handle the current data format and generate mask designs for the machine that makes the masks in Copenhagen.

In the mean time an overhaul was made of the ALFOSC MOS user documentation pages to reflect the current situation properly.

Thomas Augusteijn 2009-05-14